Electrical Characteristics of n-ZnO/p-Si Heterojunction Diodes Grown by Pulsed Laser Deposition at Different Oxygen Pressures

被引:0
作者
R.S. Ajimsha
M.K. Jayaraj
L.M. Kukreja
机构
[1] Cochin University of Science and Technology,Optoelectronics Devices Laboratory, Department of Physics
[2] Raja Ramanna Centre for Advanced Technology,Laser Materials Processing Division
来源
Journal of Electronic Materials | 2008年 / 37卷
关键词
Heterojunctions; ZnO; -Si; pulsed laser deposition;
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摘要
Heterojunction diodes of n-type ZnO/p-type silicon (100) were fabricated by pulsed laser deposition of ZnO films on p-Si substrates in oxygen ambient at different pressures. These heterojunctions were found to be rectifying with a maximum forward-to-reverse current ratio of about 1,000 in the applied voltage range of −5 V to +5 V. The turn-on voltage of the heterojunctions was found to depend on the ambient oxygen pressure during the growth of the ZnO film. The current density–voltage characteristics and the variation of the series resistance of the n-ZnO/p-Si heterojunctions were found to be in line with the Anderson model and Burstein-Moss (BM) shift.
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页码:770 / 775
页数:5
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共 118 条
[1]  
Look D.C.(2002)undefined Appl. Phys. Lett. 81 1830-undefined
[2]  
Reynolds D.C.(1998)undefined J. Vac. Sci. Technol. A 16 669-undefined
[3]  
Litton C.W.(2000)undefined Appl. Phys. Lett. 76 259-undefined
[4]  
Jones R.L.(2002)undefined Appl. Phys. Lett. 81 3648-undefined
[5]  
Eason D.B.(2001)undefined J.␣Appl. Phys. 90 5763-undefined
[6]  
Cantwell G.(2001)undefined J. Appl. Phys. 89 5720-undefined
[7]  
Hiramatsu M.(1993)undefined Thin Solid Films 236 27-undefined
[8]  
Imaeda K.(2003)undefined Appl. Phys. Lett. 82 733-undefined
[9]  
Horio N.(2006)undefined Appl. Phys. Lett. 89 161912-undefined
[10]  
Nawata M.(1979)undefined J. Vac. Sci. Technol. 16 994-undefined