Soft lithography-mediated microscale patterning of silica on diverse substrates

被引：4

作者：

Butler, Randall ^{[2
]}

Ferrell, Nicholas ^{[1
]}

Hansford, Derek ^{[1
]}

Naik, Rajesh ^{[3
]}

机构：

[1] Ohio State Univ, Dept Biomed Engn, Columbus, OH 43210 USA

[2] Ohio State Univ, Dept Mat Sci & Engn, Columbus, OH 43210 USA

[3] USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA

来源：

JOURNAL OF MATERIALS RESEARCH | 2009年 / 24卷 / 05期

关键词：

SELF-ASSEMBLED MONOLAYERS; POLY-L-LYSINE; IN-VITRO; BIOSILICA; BIOSILICIFICATION; POLYMERIZATION; SILICIFICATION; FABRICATION; PEPTIDES; MICROPARTICLES;

D O I：

10.1557/JMR.2009.0200

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have developed a soft lithography-based process to create microscale patterns of silica on a diverse array of substrates. A sacrificial polymer layer was first patterned using a micromolding technique. A peptide was adsorbed on the substrate and the sacrificial layer was removed. The patterned peptide template then catalyzed the deposition of silica from a silicic acid solution. With this procedure, we have created both continuous and discontinuous silica patterns on metallic, ceramic, and polymer substrates.

引用

页码：1632 / 1638

页数：7

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