Organic Resist Contrast Determination in Ion Beam Lithography

被引：0

作者：

Ya. L. Shabelnikova

S. I. Zaitsev

N. Gusseinov

M. Gabdullin

M. M. Muratov

机构：

[1] Institute of Microelectronic Technology Problems and High Purity Materials of the Russian Academy of Sciences,

[2] National Nanotechnological Laboratory of Open Type (NNLOT),undefined

[3] Al-Farabi Kazakh National University,undefined

[4] Kazakh-British Technical University,undefined

来源：

Semiconductors | 2020年 / 54卷

关键词：

ion beam lithography; resist; contrast; PMMA;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1854 / 1857

页数：3

共 89 条

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