Tensile testing of microfabricated thin films

被引：0

作者：

H. Ogawa

K. Suzuki

S. Kaneko

Y. Nakano

Y. Ishikawa

T. Kitahara

机构：

[1] Mechanical Engineering Laboratory,

[2] AIST,undefined

[3] MITI,undefined

[4] Department of Advanced Machinery Namiki 1-2,undefined

[5] Tsukuba,undefined

[6] Ibaraki,undefined

[7] 305 Japan,undefined

[8] Olympus Optical Co.,undefined

[9] Ltd.,undefined

[10] Research Department Kuboyama-cho 2-3,undefined

[11] Hachioji,undefined

[12] Tokyo,undefined

[13] 192 Japan,undefined

[14] Shonan Institute of Technology Nishikaigan 1-1-25,undefined

[15] Tsujido,undefined

[16] Fujisawa,undefined

[17] Kanagawa,undefined

[18] 251 Japan,undefined

来源：

Microsystem Technologies | 1997年 / 3卷

关键词：

Titanium; Thin Film; Tensile Strength; Test Section; Gauge Length;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Mechanical properties of titanium thin films of 0.5 μm thickness and aluminum thin films of 1.0 μm thickness, microfabricated by magnetron sputtering, were measured by using a novel tensile machine. These thin films are difficult to handle because they are fragile, so the thin film specimens were fabricated by using semiconductor manufacturing technology in a silicon frame to protect them. The test section of these specimens was 300 μm in width and 1400 μm in gauge length. By gripping the thin film specimen with a new device using a micrometer, it could be mounted on the tensile machine easily. The stress-strain diagrams of both thin films were measured continuously in the atmosphere at room temperature. The experimental results indicated that the titanium thin film and the aluminum thin film had a smaller breaking elongation although they had a larger tensile strength than bulk pure titanium and bulk pure aluminum, respectively.

引用

页码：117 / 121

页数：4