Contribution of UV light to the decomposition of toluene in dielectric barrier discharge plasma/photocatalysis system

被引：0
作者：
Hai Bao Huang
Dai Qi Ye
Ming Li Fu
Fa Da Feng
机构：
[1] South China University of Technology,College of Environmental Science and Engineering
来源：
Plasma Chemistry and Plasma Processing | 2007年 / 27卷
关键词：
Dielectric barrier discharge; UV light; Photocatalysis; Plasma/photocatalysis; Toluene;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The contribution of UV light from plasma and an external UV lamp to the decomposition of toluene in a dielectric barrier discharge (DBD) plasma/UV system, as well as in a plasma/photocatalysis system was investigated. It was found that UV light from the DBD reactor was very weak. Its contribution to the removal of toluene in the plasma/photocatalysis system could be ignored. Whereas, the introduction of external UV light to the plasma significantly improves the removal efficiency of toluene by 20%. The removal efficiency of toluene in the plasma/photocatalysis system increased about 22% and 16% when compared with a plasma only system and plasma driven photocatalyst system, respectively. The increased toluene removal efficiency was mostly attributed to the contribution of the synergy between plasma and UV light, but not to the synergy between plasma and photocatalysis. The synergetic effect between plasma and photocatalysis was not significant.
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页码：577 / 588
页数：11
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