Double Gate Double-Channel AlGaN/GaN MOS HEMT and its Applications to LNA with Sub-1 dB Noise Figure

被引:0
作者
Mahdi Vadizadeh
Mohammad Fallahnejad
Maryam Shaveisi
Reyhaneh Ejlali
Farshad Bajelan
机构
[1] Islamic Azad University,Department of Electrical Engineering, Abhar Branch
[2] Islamic Azad University,Department of Electrical Engineering, Central Tehran Branch
[3] Kermanshah University of Technology,Department of Electrical Engineering
来源
Silicon | 2023年 / 15卷
关键词
Low-noise amplifier (LNA); Double gate double-channel; High electron mobility transistor (HEMT); Noise figure (NF);
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中图分类号
学科分类号
摘要
The manuscript proposes a novel double gate double-channel AlGaN/GaN MOS high electron mobility transistor (DG-DC-MOS-HEMT) for the low noise amplifier (LNA) applications. Double-channel structure importance on high-frequency noise and analog/RF performance of AlGaN/GaN HEMT have been explored in this work through TCAD device simulations. The existence of lower channels improves the transconductance (gm), unity gain cut-off frequency (fT), and minimum noise figure (NFmin) of DG-DC-MOS-HEMT compared to DG-MOS-HEMT. The DG-DC-MOS-HEMT with channel length of 220 nm exhibits gm of 0.85mS/um, fT of 137GHz, and NFmin of 0.21 dB. For the first time in this paper, an LNA using DG-DC-MOS-HEMT has been designed for X-Band radar applications. An s2p model is developed for DG-DC-MOS-HEMT and the models are incorporated into the ADS simulator to utilize the proposed device in circuit simulations. Comparing the results of LNA by DG-DC-MOS-HEMT with LNA by DG-MOS-HEMT at f = 10GHz, an increase of 56% and 36%, respectively, in noise figure (NF) and forward voltage gain (S21), was found. This paper gives an opportunity to attain high-performance LNA with the proposed DG-DC-MOS-HEMT.
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页码:1093 / 1103
页数:10
相关论文
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