Characterization of topologically close-packed phases in secondary reaction zone in a coated CMSX-4 single crystal Ni-based superalloy

被引：0

作者：

X. P. Tan

H. U. Hong

B. G. Choi

I. S. Kim

C. Y. Jo

T. Jin

Z. Q. Hu

机构：

[1] Korea Institute of Materials Science,High Temperature Materials Research Group

[2] Institute of Metal Research,Superalloy Division

[3] Chinese Academy of Sciences,Departement of Materials Science and Engineering

[4] Changwon National University,undefined

来源：

Journal of Materials Science | 2013年 / 48卷

关键词：

Select Area Electron Diffraction; HVOF; Bond Coat; Discontinuous Precipitation; HAADF Image;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The topologically close-packed (TCP) precipitation in the secondary reaction zone (SRZ) in a thermal barrier coated alloy CMSX-4 has been investigated. The selected area electron diffraction (SAED) and high-angle annular dark field (HAADF) were used to analyze the TCP precipitates in the three different regions (including the SRZ, grain boundaries, and substrate) in this study. It was found that the interface between the SRZ and substrate was a high-angle grain boundary with a misorientation of ~51°. The TCP precipitates at the grain boundaries could inhibit the growth of SRZ. The SAED results indicate that most TCP precipitates were the faulted or twinned μ phase. In addition, the intergrowth of P phase with μ phase was found.

引用

页码：1085 / 1089

页数：4

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