PMN-PT thin films grown by sputtering on silicon substrate: influence of the annealing temperature on the physico-chemical and electrical properties of the films

被引:0
作者
D. Rémiens
M. Detalle
R. Herdier
C. Soyer
Genshui Wang
David Jenkins
Pascal Roussel
机构
[1] Université de Valenciennes et du Hainaut-Cambrésis,IEMN
[2] Chinese Academy of Sciences,DOAE
[3] University of Plymouth,MIMM UMR CNRS 8520
[4] Université Sciences et Techniques de Lille,Laboratory for Ferroelectric Ceramics and Application, Research Centre for Information Functional Materials and Devices, Shanghai Institute of Ceramics
来源
Research on Chemical Intermediates | 2008年 / 34卷
关键词
Annealing temperature; silicon; thin film; piezoelectricity; electrostrictivity;
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摘要
Studies of piezoelectric and electrostrictive properties of (1−x)PMN-xPT thin films were carried out. We have chosen the compositions 90/10 and 70/30, which exhibit, respectively, mostly electrostrictive and piezoelectric behaviour in bulk material. Annealing temperature effects on PMN-PT structural, dielectric, ferroelectric and electromechanical properties have been investigated. We demonstrate that with conventional annealing the pure perovskite phase can be obtained at very low temperature (400°C) without any pyrochlore phase for the two compositions. We show that electromechanical response is a mix between electrostrictive and piezoelectric response for the two compositions. However, as can be easily understood, piezoelectric contribution is larger for 70/30. It is shown that electrical responses of the films obtained at 400°C are largely satisfied for many applications; for higher annealing temperature we observe an enhance of the electrical properties due to an improvement of the material quality in terms of crystalline structure.
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页码:201 / 215
页数:14
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