Minimum size of 180 degree domains in ferroelectric thin films covered by electrodes

被引:0
|
作者
Yong-qiu Chen
Yu-lan Liu
Biao Wang
机构
[1] Harbin University of Science and Technology,School of Mechanical and Power Engineering
[2] Sun Yat-sen University,School of Physics and Engineering
来源
Applied Mathematics and Mechanics | 2006年 / 27卷
关键词
ferroelectric film; 180° domain; stability analysis; back switching; O322; 70K20;
D O I
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中图分类号
学科分类号
摘要
Ferroelectric domain switching under low voltage or short pulses is of interest for the development of high-density random access memory (FRAM) devices. Being necessarily very small in size, instability and back switching often occur when the external voltage is removed, which creates serious problems. In this investigation, a general approach to determine the minimum size of ferroelectric domain to avoid back switching was developed, and as an example, a 180° domain in a ferroelectric thin film covered by the upper and lower electrodes was considered in detail. We note that our approach is generally applicable to many other fields, including phase transformation, nucleation and expansion of dislocation loops in thin films, etc.
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页码:1031 / 1036
页数:5
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