Temperature Dependence and High-Temperature Stability of the Annealed Ni/Au Ohmic Contact to p-Type GaN in Air

被引:0
|
作者
Shirong Zhao
Heather McFavilen
Shuo Wang
Fernando A. Ponce
Chantal Arena
Stephen Goodnick
Srabanti Chowdhury
机构
[1] Arizona State University,School of Electrical, Computer and Energy Engineering
[2] Soitec Phoenix Labs,Department of Physics
[3] Arizona State University,undefined
来源
Journal of Electronic Materials | 2016年 / 45卷
关键词
Ni/Au ohmic contacts; -type GaN; specific contact resistivity; high-temperature electronics;
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摘要
We report on the temperature-dependent contact resistivity and high-temperature stability of the annealed Ni/Au ohmic contacts to p-type GaN in air. As the measure temperature increases from 25°C to 390°C, both the specific contact resistivity (ρc) and sheet resistance (Rsh) decrease by factors ∼10, contributing to the 10-fold increase in current at 390°C compared with that at 25°C. It was also observed that the ρc was further reduced by 36%, i.e., from 2.2 × 10−3 Ω cm2 to 1.4 × 10−3 Ω cm2, during the 48-h high-temperature stability test at 450°C in air, showing excellent stability of the contacts. An increase in ρc was observed after the contacts were subjected to 500°C in air. Higher temperature stress led to a significant increase in ρc. The contacts show rectifying I–V characteristics after being subjected to 700°C for 1 h. The degradation mechanics were analyzed with the assistance of transmission electron microscopy and energy dispersive x-ray spectroscopy.
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页码:2087 / 2091
页数:4
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