Electrical characterization of low defect density nonpolar (11¯20) a-plane GaN grown with sidewall lateral epitaxial overgrowth (SLEO)

被引：0
作者：
Bilge Imer
Benjamin Haskell
Siddharth Rajan
Stacia Keller
Umesh K. Mishra
Shuji Nakamura
James S. Speck
Steven P. DenBaars
机构：
[1] University of California–Santa Barbara,Materials Department
[2] Japan Science and Technology Corporation (NICP/ERATO JST) Group,Exploratory Research for Advanced Technology
[3] University of California–Santa Barbara,Electrical and Computer Engineering Department
[4] University of California–Santa Barbara,undefined
来源：
Journal of Materials Research | 2008年 / 23卷
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摘要：
We studied the effect of extended defects on electrical characteristics of Si doped n-type nonpolar a-plane GaN films. The n-type GaN layers were grown on co-loaded reduced defect density sidewall lateral epitaxial overgrowth (SLEO) a-plane GaN templates and high defect density planar a-plane GaN templates by metalorganic chemical vapor deposition (MOCVD). The highest conductivity value was observed at the carrier concentration of 1.05 × 1019 cm−3 as 261.12 cm2/Vs for SLEO a-GaN and 106.77 cm2/Vs for the planar a-plane GaN samples. At the same doping level, the carrier compensation for SLEO samples was ∼12% less than planar samples.
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页码：551 / 555
页数：4
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