Reactive Magnetron Sputter Deposition of Titanium Oxynitride TiNxOy Coatings: Influence of Substrate Bias Voltage on the Structure, Composition, and Properties

被引：0

作者：

N. Saoula

L. Bait

S. Sali

M. Azibi

A. Hammouche

N. Madaoui

机构：

[1] Division Milieux Ionisés et Lasers,

[2] Centre de Développement des Technologies Avancées (CDTA),undefined

[3] Baba Hassen,undefined

[4] Centre de Recherche en Technologie des Semi-conducteurs pour l’Energétique CRTSE–02,undefined

来源：

Protection of Metals and Physical Chemistry of Surfaces | 2019年 / 55卷

关键词：

magnetron sputtering; TiN; O; 316L; bias voltage;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：743 / 747

页数：4

共 131 条

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