Copper Grid/ITO Transparent Electrodes Prepared by Laser Induced Deposition for Multifunctional Optoelectronic Devices

Abstract: For large scale production on light emitting diodes and solar cells it is necessary to create semitransparent electrodes with large area and low sheet resistance parameters. This work describes two approaches of creation metal grid on dielectric surface for producing copper/ITO hybrid transparent electrodes. First one is to create metal grid by magnetron sputtering with further photography and the second one is Laser Induced Chemical Deposition. LCLD is one of the most flexible methods for local contacts formation of metals by laser induced chemical reactions in deep eutectic solution (DES) on different surfaces. It was possible to reduce the surface resistance of ITO-sputtered substrates from 17 Ohm/square to 6.1 Ohm/square, with insignificant losses in transmittance from 91.5 to 82.6% for a metal mesh obtained by magnetron sputtering. For electrodes obtained using LCLD method, it was possible to reduce the sheet resistance to 11.25 Ohm/square with a transmission of 82.2%. Thus, a single-stage template-free method for the formation of metal structures for the creation of semitransparent Cu/ITO electrodes has been demonstrated. © 2022, Allerton Press, Inc.