Chemical Vapor Deposition of Y2O3 Films Using Y(dpm)3

被引：0
|
作者：
V. V. Bakovets
T. M. Levashova
V. T. Ratushnyak
L. F. Bakhturova
机构：
[1] Institute of Inorganic Chemistry,
[2] Siberian Division,undefined
[3] Russian Academy of Sciences,undefined
来源：
Inorganic Materials | 2002年 / 38卷
关键词：
H2O2; Argon; Refractive Index; Inorganic Chemistry; Surface Morphology;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Data are presented on the kinetics of Y2O3 deposition via thermal decomposition of yttrium tris(2,2,6,6-tetramethyl-3,5-heptanedionate) vapor at atmospheric pressure in flowing argon with H2O2 additions. The IR spectra, surface morphology, structure, and electrical properties of the films were investigated. The thickness and refractive index of the films were determined by ellipsometry.
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页码：371 / 373
页数：2
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