The Effect of Substrate Position during Cylindrical DC Magnetron Sputtering on Physical Properties of Fe7Co3 Thin Film

The high saturation induction makes Fe1−xCox thin films desirable for use as recording head materials. In this experiment, Fe7Co3 thin films were deposited by DC cylindrical magnetron sputtering using the different position of glass substrate in argon pressure of 2 × 10−2 Torr under sputtering power of 120 W. The magnetic properties were determined by scanning probe microscopy. The surface morphology and r.m.s roughness of thin films were analyzed using atomic force microscopy and the optical properties have been analyzed by spectrophotometer. The thin film thickness, grain size and optical properties were affected by changing substrate position and we found the deposition influenced magnetic properties and surface morphology.