Nondestructive Characterization of Residual Threading Dislocation Density in HgCdTe Layers Grown on CdZnTe by Liquid-Phase Epitaxy

被引:1
|
作者
Y. Fourreau
K. Pantzas
G. Patriarche
V. Destefanis
机构
[1] SOFRADIR-Development and Production Center,Laboratoire de Photonique et de Nanostructures (LPN)
[2] CNRS,undefined
[3] Université Paris-Saclay,undefined
来源
关键词
HgCdTe; etch pit density; dislocation; liquid-phase epitaxy; atomic force microscopy; white-light interferometry;
D O I
暂无
中图分类号
学科分类号
摘要
The performance of mercury cadmium telluride (MCT)-based infrared (IR) focal-plane arrays is closely related to the crystalline perfection of the HgCdTe thin film. In this work, Te-rich, (111)B-oriented HgCdTe epilayers grown by liquid-phase epitaxy on CdZnTe substrates have been studied. Surface atomic steps are shown on as-grown MCT materials using atomic force microscopy (AFM) and white-light interferometry (WLI), suggesting step-flow growth. Locally, quasiperfect surface spirals are also evidenced. A demonstration is given that these spirals are related to the emergence of almost pure screw threading dislocations. A nondestructive and quantitative technique to measure the threading dislocation density is proposed. The technique consists of counting the surface spirals on the as-grown MCT surface from images obtained by either AFM or WLI measurements. The benefits and drawbacks of both destructive—chemical etching of HgCdTe dislocations—and nondestructive surface imaging techniques are compared. The nature of defects is also discussed. Finally, state-of-the-art threading dislocation densities in the low 104 cm−2 range are evidenced by both etch pit density (EPD) and surface imaging measurements.
引用
收藏
页码:4518 / 4523
页数:5
相关论文
共 50 条
  • [41] Photoluminescence characterization of Te-doped GaSb layers grown by liquid-phase epitaxy from Bi melts
    Gladkov, P
    Monova, E
    Weber, J
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1997, 12 (11) : 1409 - 1415
  • [42] P ON N ION-IMPLANTED JUNCTIONS IN LIQUID-PHASE EPITAXY HGCDTE LAYERS ON CDTE SUBSTRATES
    BUBULAC, LO
    LO, DS
    TENNANT, WE
    EDWALL, DD
    CHEN, JC
    RATUSNIK, J
    ROBINSON, JC
    BOSTRUP, G
    APPLIED PHYSICS LETTERS, 1987, 50 (22) : 1586 - 1588
  • [43] Optical properties of thick GaInAs(Sb)N layers grown by liquid-phase epitaxy
    Donchev, V.
    Asenova, I.
    Milanova, M.
    Alonso-Alvarez, D.
    Kirilov, K.
    Shtinkov, N.
    Ivanov, I. G.
    Georgiev, S.
    Valcheva, E.
    Ekins-Daukes, N.
    19TH INTERNATIONAL SCHOOL ON CONDENSED MATTER PHYSICS (ISCMP): ADVANCES IN NANOSTRUCTURED CONDENSED MATTER: RESEARCH AND INNOVATIONS, 2017, 794
  • [44] High-Quality GaInAsSb and GaAlAsSb layers for thermophotovoltaics grown by Liquid-Phase Epitaxy
    Milanova, M.
    Kakanakov, R.
    Koleva, G.
    Vitanov, P.
    Bakardjieva, V.
    Zamoryanskaya, M.
    Popova, T.
    NANOSTRUCTURED MATERIALS, THIN FILMS AND HARD COATINGS FOR ADVANCED APPLICATIONS, 2010, 159 : 87 - +
  • [45] Dilute nitride InGaAsN and GaAsSbN layers grown by liquid-phase epitaxy for photovoltaic applications
    Donchev, V
    Milanova, M.
    Georgiev, S.
    Kostov, K. L.
    Kirilov, K.
    21ST INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES, 2020, 1492
  • [46] DIFFUSION OF TIN IN LEAD TIN TELLURIDE EPITAXIAL LAYERS GROWN BY LIQUID-PHASE EPITAXY
    CROCKER, AJ
    DAVIS, W
    JONES, G
    THIN SOLID FILMS, 1986, 140 (02) : 237 - 243
  • [47] THE EFFECT OF GD DOPING ON CARRIER CONCENTRATION IN INGAASSB LAYERS GROWN BY LIQUID-PHASE EPITAXY
    DOLGINOV, LM
    TUNITSKAYA, IV
    POLYAKOV, AY
    DRUZHININA, LV
    VINOGRADOVA, GV
    SMIRNOV, NB
    GOVORKOV, AV
    BORODINA, OM
    KOZHUKHOVA, EA
    BALMASHNOV, AA
    MILNES, AG
    THIN SOLID FILMS, 1994, 251 (02) : 147 - 150
  • [48] CDXHG1-XTE DOUBLE-LAYERS GROWN BY LIQUID-PHASE EPITAXY
    YASUMURA, K
    MURAKAMI, T
    SUITA, M
    TAKADA, H
    TAKAHASHI, K
    NUNOSHITA, M
    KAWAZU, Z
    JOURNAL OF CRYSTAL GROWTH, 1992, 117 (1-4) : 20 - 23
  • [49] Surface morphology of silicon layers grown on patterned silicon substrates by liquid-phase epitaxy
    Weber, KJ
    Catchpole, KR
    JOURNAL OF CRYSTAL GROWTH, 1999, 204 (04) : 453 - 461
  • [50] THIN EPITAXIAL GALLIUM ALUMINUM ARSENIDE LAYERS GROWN BY MULTICOMPARTMENT LIQUID-PHASE EPITAXY
    LU, YC
    BAUSER, E
    QUEISSER, HJ
    JOURNAL OF CRYSTAL GROWTH, 1992, 121 (04) : 566 - 570