共 50 条
- [32] Comparison of models for silicon etching in CF4 + O2 plasma VACUUM, 2012, 86 (12) : 1964 - 1968
- [34] Nanoscale dry etching of germanium by using inductively coupled CF4 plasma Electronic Materials Letters, 2012, 8 : 423 - 428
- [39] Positive ions in RF discharge plasma of CF4 gas in a planar diode JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (07): : 4081 - 4082
- [40] Simulation of SiO2 etching in an inductively coupled CF4 plasma MODERN PHYSICS LETTERS B, 2017, 31 (06):