Surface Potential and Drain Current 2D Analytical Modeling of Low Power Double Gate Tunnel FET
被引:0
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作者:
Dhruv Garg
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机构:NIT Jalandhar,Nanoelectronics Research Lab, Department of ECE
Dhruv Garg
Girish Wadhwa
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h-index: 0
机构:NIT Jalandhar,Nanoelectronics Research Lab, Department of ECE
Girish Wadhwa
Shailendra Singh
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h-index: 0
机构:NIT Jalandhar,Nanoelectronics Research Lab, Department of ECE
Shailendra Singh
Ashish Raman
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h-index: 0
机构:NIT Jalandhar,Nanoelectronics Research Lab, Department of ECE
Ashish Raman
Balwinder Raj
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h-index: 0
机构:NIT Jalandhar,Nanoelectronics Research Lab, Department of ECE
Balwinder Raj
机构:
[1] NIT Jalandhar,Nanoelectronics Research Lab, Department of ECE
[2] National Institute of Technical Teachers Training and Research Chandigarh,undefined
来源:
Transactions on Electrical and Electronic Materials
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2021年
/
22卷
关键词:
Tunnel FET;
Analytical model;
Band gap widening;
Cardinal elements;
Dual modulation effects;
D O I:
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学科分类号:
摘要:
This submitted work presents the 2-dimensional analytical modeling of Tunnel FET’s in consideration with the inherent properties of dual modulation effect. This effect explains the concept of regulating both gate and also the drain terminal biasing voltage on device surface potential and hence on the tunneling drain current model, which uses the device surface potential modeling as basis of deriving the TFET current model. The model is developed using basic 2-D Poisson’s equation. This analytical model embraces both the biasing voltage effect at gate and drain terminal respectively. The results procured from the submitted work are in perfect agreement with TCAD simulations results and depletion width of various regions defined in TFET is accurate and can also be explained theoretically.