Surface Relief Forming on Optical Ceramic Articles by Laser Pyrolysis of Organosilicon Materials

被引:0
作者
E. V. Dorofeeva
P. Yu. Lobanov
I. S. Manuilovich
M. N. Meshkov
O. E. Sidoryuk
机构
[1] M. F. Stel’makh Scientific-Research Institute ‘Polyus,
[2] ’,undefined
来源
Glass and Ceramics | 2017年 / 73卷
关键词
optical surface; glass ceramic; sitall; coating; laser deposition; pyrolysis; tetraethoxysilane;
D O I
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中图分类号
学科分类号
摘要
This is devoted to the development of technology for forming the required microrelief of the optical surfaces of glass-ceramic substrates. It is shown that the problem can be solved by using controlled local deposition of silicon dioxide coatings on the surface by laser pyrolysis of tetraethoxysilane vapor in the presence of ozone. The characteristics of the experimental samples are presented and are compared with data obtained from mathematical modeling of the results of technological processes. It is shown that the developed technology can be used to profile substrates with large radii of curvature by successive deposition of multifilm coatings of interference spherical mirrors.
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页码:400 / 405
页数:5
相关论文
共 23 条
[1]  
Zeuner M(2012)Ion beam figuring technology in optics manufacturing: An established alternative for commercial applications Optik & Photonik 7 56-58
[2]  
Kiontke S(2007)Correction of high spatial frequency errors on optical surfaces by means of Ion Beam Figuring Proc. of SPIE 6671 667114-6
[3]  
Ghigo M(2012)Reactive atom plasma for rapid figure correction of optical surfaces Key Eng. Mater. 496 182-187
[4]  
Canestrari R(2010)“Effect on surface roughness of zerodur material in atmospheric pressure plasma jet processing,” Proc. SPIE 7655 76552X1-7
[5]  
Spiga D(1993)Making aspherical mirrors by thin-film deposition Appl. Opt. 32 5535-5540
[6]  
Novi A(2004)Aspherization high-precision optical elements by vacuum deposition Opt. Zh. 71 14-19
[7]  
Castelli M(1989)Decomposition chemistry of tetraethoxysilane J. Am. Ceram. Soc. 72 1615-1621
[8]  
Jourdain R(2010)SiO J. Electrochem. Soc. 157 H182-H185
[9]  
Morantz P(1994) Films deposited by APCVD with a TEOS/ozone mixture and its application to the gate dielectric of TFTs J. Cryst. Growth 140 315-326
[10]  
Shore P(undefined)Analytical model for chemical vapor deposition of SiO undefined undefined undefined-undefined