Patterning Si by using surface functionalization and microcontact printing with a polymeric ink

被引：0
作者：
Kyung-Bok Lee
Dong Jin Kim
Kuk Ro Yoon
Yongseong Kim
Insung S. Choi
机构：
[1] Korea Advanced Institute of Science and Technology (KAIST),Department of Chemistry
[2] Kyungnam University Masan,Division of Chemistry and Chemical Engineering
来源：
Korean Journal of Chemical Engineering | 2003年 / 20卷
关键词：
Pattern Generation; Microcontact Printing; Self-assembled Monolayers (SAMs); Si Etching;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This paper describes a simple procedure for patterning Si substrate using a combination of surface functionalization and microcontact printing(ΜCP). The Si/SiO2 surfaces were chemically modified to present self-assembled monolayers (SAMs) of siloxanes terminating in reactive carboxylic anhydride groups and then patterned with poly(ethylene imine) (PEI) by, ΜCP We used the patterned thin films of PEI as etch resists on Si surfaces.
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页码：956 / 959
页数：3
相关论文
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