Fracture of nanoporous methyl silsesquioxane thin-film glasses

被引：0
作者：
Guyer E.P. [1 ,3 ]
Patz M. [2 ]
Dauskardt R.H. [1 ]
机构：
[1] Department of Materials Science and Engineering, Stanford University, Stanford
[2] Tsukuba Research Laboratory, JSR Corporation, Tsukuba
[3] Exponent Failure Analysis Associates, Menlo Park
来源：
Journal of Materials Research | 2006年 / 21卷 / 4期
基金：
美国能源部;
关键词：
D O I：
10.1557/jmr.2006.0106
中图分类号：
学科分类号：
摘要：
The fracture of nanoporous methylsilsesquioxane thin-film glasses in moist air and aqueous solutions was investigated. We demonstrate the effects of controlled volume fractions of nanometer sized pores on the films resistance to fracture. Subcritical cracking accelerated by the presence of moisture, controlled pH, and hydrogen peroxide solutions is reported. Surprising changes in the near threshold growth rate behavior were observed for buffered solutions. We demonstrate that these changes are related to the unexpected diffusion of the aqueous solutions into the highly hydrophobic films. The presence of the solution changes the surface stress of the internal pore surfaces, which changes the stress state of the film. The change in film stress surrounding the crack alters the crack driving force and has profound effects on the resulting crack-growth threshold behavior. © 2006 Materials Research Society.
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页码：882 / 894
页数：12
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