Preparation of TiSi2 via flash lamp processing of TiN/Ti/Si heterostructures

被引：0

作者：

V. M. Ievlev

S. V. Kannykin

V. V. Kolos

S. B. Kushchev

M. I. Markevich

A. M. Chaplanov

V. F. Stel’makh

机构：

[1] Voronezh State University,Institute of Physics and Technology

[2] Voronezh State Technical University,undefined

[3] NPO Integral Research and Production Association,undefined

[4] Belarussian Academy of Sciences,undefined

[5] Belarussian State University,undefined

来源：

Inorganic Materials | 2009年 / 45卷

关键词：

Native Oxide Layer; Titanium Silicide; Incoherent Light; Select Area Electron Diffrac; Light Pulse Duration;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The structural and phase transformations induced in the TiN/Ti/Si system by flash processing with incoherent light have been studied by transmission electron microscopy and Auger electron spectroscopy. The conditions have been identified under which polycrystalline C49 or C54 TiSi2 films grow.

引用

页码：773 / 776

页数：3

共 12 条

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[3]

Schillera V.(1985) Phase Transformation Characteristics on Narrow Devices Phys. B + C (Amsterdam, Neth.) 129 205-209

[4]

Vály G.(1989)Formation of Palladium and Titanium Silicides by Rapid Thermal Annealing J. Vac. Sci. Technol. 7 604-608

[5]

Glen L.(undefined)The Growth of Titanium Silicides in Thin Film Ti/Si Structures undefined undefined undefined-undefined

[6]

Miles S.(undefined)undefined undefined undefined undefined-undefined

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Randy W.(undefined)undefined undefined undefined undefined-undefined

[8]

Levy D.(undefined)undefined undefined undefined undefined-undefined

[9]

Ponpon J.P.(undefined)undefined undefined undefined undefined-undefined

[10]

Grob A.(undefined)undefined undefined undefined undefined-undefined

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