Influence of deposition parameters on mechanical properties of sputter-deposited Cr2O3 thin films

被引：26

作者：

Hones P. ^{[1
]}

Lévy F. ^{[1
]}

Randall N.X. ^{[2
]}

机构：

[1] EPFL-Inst. de Phys. Appliquée, Ecl. Polytech. Federale de Lausanne

[2] CSEM Instruments, CH-2007 Neuchâtel

来源：

Journal of Materials Research | 1999年 / 14卷 / 9期

关键词：

D O I：

10.1557/JMR.1999.0489

中图分类号：

学科分类号：

摘要：

Among the oxides, Cr2O3 exhibits the highest hardness value and a low coefficient of friction. These properties make chromium oxide an excellent coating material for tribological applications. Cr2O3 thin films were deposited by radio-frequency reactive magnetron sputtering at substrate temperature in the range 363-593 K. The hardness and elastic modulus of the films were measured by two complementary nanoindentation techniques to investigate the influences of the substrate temperature and the oxygen content in the sputtering gas. While the continuous stiffness data method provides information throughout the whole film thickness, nanoindentation combined with scanning force microscopy of the residual imprints allows visualization of pileup, cracking, and delamination from the substrate. Hardness values up to 32 GPa were obtained for substrate temperatures exceeding 500 K and oxygen contents between 15% and 25% of the total gas pressure. The films, obtained with these deposition conditions, showed good adhesion to silicon substrates.

引用

页码：3623 / 3629

页数：6

共 25 条

[1]

Samsonov G.V., The Oxide Handbook, 2nd Ed., (1982)

[2]

Zhang J.L., Huang J., Ding C., J. Therm. Spray Technol., 7, (1998)

[3]

Bhushan B., Theunissen G.S., Li X., Thin Solid Films, 311, (1997)

[4]

Sundgren J.-E., Hentzell H.T.G., J. Vac. Sci. Technol, A, 4, (1986)

[5]

Zieren V., Jongh M.D., Groenou A.B.V., Zon J.B.V., Lansinski P., Theunissen G.S., IEEE Trans. Magn., 30, (1994)

[6]

Loubet J., Georges J.M., Marchesini D., Meille G., J. Tribology, 106, (1984)

[7]

Page T.F., Oliver W.C., McHargue C.J., J. Mater. Res., 7, (1992)

[8]

Bhushan B., Williams V.S., Shack R.V., Trans. ASME J. Tribol., 110, (1988)

[9]

Nishibori M., Kinosita K., Thin Solid Films, 48, (1978)

[10]

Pollock H.M., ASM Handbook, 18, pp. 419-429, (1992)

← 1 2 3 →