Influence of carrier concentration on the resistive switching characteristics of a ZnO-based memristor

被引:0
|
作者
Yihui Sun
Xiaoqin Yan
Xin Zheng
Yichong Liu
Yanwei Shen
Yue Zhang
机构
[1] University of Science and Technology Beijing,State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering
[2] University of Science and Technology Beijing,Beijing Municipal Key Laboratory of New Energy Materials and Technologies
来源
Nano Research | 2016年 / 9卷
关键词
resistive switch; carrier concentration; driving force; potential gradient; concentration gradient;
D O I
暂无
中图分类号
学科分类号
摘要
Sandwich-style memristor devices were synthesized by electrochemical deposition with a ZnO film serving as the active layer between Al-doped ZnO (AZO) and Au electrodes. The carrier concentration of the ZnO films is controlled by adding HNO3 during the growth process. A resulting increase in carrier concentration from 1017 to 1019 cm–3 was observed, along with a corresponding drop in the on–off ratio from 6,437% to 100%. The resistive switching characteristics completely disappeared when the carrier concentration was above 1019 cm–3, making it unsuitable for a memory device. The decreasing switching ratio is attributed to a reduction in the driving force for oxygen vacancy drift. Systematic analysis of the migration of oxygen vacancies is presented, including the concentration gradient and electrical potential gradient. Such oxygen vacancy migration dynamics provide insight into the mechanisms of the oxygen vacancy drift and provide valuable information for industrial production of memristor devices.
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页码:1116 / 1124
页数:8
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