Anomalous lateral Zn surface diffusion in InP caused by Zn-contained metallization

被引:1
作者
Park M.-H. [1 ]
Hao P.H. [1 ]
Wang L.C. [1 ]
机构
[1] Electrical Engineering Department, Texas A and M University, College Station
基金
美国国家科学基金会;
关键词
InP; Pd/Zn/Pd contact; Zn surface diffusion;
D O I
10.1007/s11664-997-0128-2
中图分类号
学科分类号
摘要
We report an anomalous Zn surface diffusion in InP during annealing of ohmic contact structures containing Zn. A Pd/Zn/Pd contact was used to demonstrate this phenomenon. Electrical properties of the contact were monitored to corroborate this anomalous surface diffusion. Cross-sectional scanning electron microscopy was also used to delineate the Zn diffusion front lines. It was found that the Zn surface lateral diffusion can extend ≥50 μm for samples annealed at 500°C or higher temperatures. Close attention should be paid to this anomalous lateral surface diffusion during fabrication of devices using Zn-contained ohmic contacts.
引用
收藏
页码:25 / 29
页数:4
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