Nanocrystalline Pt interfacial layer formed by stress in a SrBi2Ta2O9–Pt–Ti ferroelectric capacitor

被引：0
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作者：
Ching-Chich Leu
机构：
[1] National University of Kaohsiung,Department of Chemical and Materials Engineering
[2] National Cheng Kung University,Center for Micro/Nano Science and Technology
来源：
Journal of Materials Research | 2007年 / 22卷
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摘要：
A thin nanocrystalline Pt interfacial layer (IL) was observed near the SrBi2Ta2O9(SBT)–Pt interface after crystallization treatment in a SBT–Pt–Ti ferroelectric capacitor. Apart from its Pt content, this IL also incorporated large numbers of Ti and O atoms, which arose from the Ti adhesion layer and the SBT film, respectively. These atoms reacted to form TiOx, which resulted in a volume expansion during the annealing process. This phenomenon led to a putative shear stress being exerted on the Pt layer. Under such stress and thermal conditions, we speculate that the nanocrystalline Pt IL developed from the Pt bottom electrode.
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页码：1718 / 1725
页数：7
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