Very high-speed ultraviolet photodetectors fabricated on GaN

被引:0
作者
J. C. Carrano
T. Li
C. J. Eiting
R. D. Dupuis
J. C. Campbell
机构
[1] The University of Texas at Austin,Microelectronics Research Center, Department of Electrical and Computer Engineering
来源
Journal of Electronic Materials | 1999年 / 28卷
关键词
GaN; photodetectors; p-i-n; transit time; ultraviolet (UV);
D O I
暂无
中图分类号
学科分类号
摘要
We report on the temporal and the frequency response of both metal-semiconductor-metal (MSM) and p-i-n ultraviolet photodetectors fabricated on single-crystal GaN. The best MSM devices show a fast 10–90% rise-time of ∼28 psec under comparatively low ultraviolet excitation of ∼0.1 W/cm2 averagerirradiance. The fast-Fourier transform (FFT) of the pulse response data indicates a bandwidth, f3dB, of ∼3.8 GHz at a reverse bias of 25 V. This agrees well with the direct frequency response measurement value of ∼3.5 GHz. For the p-i-n devices, we measured a rise-time of ∼43 psec at 15 V reverse bias for a 60 µm diameter mesa with 1 µm thick intrinsic region. The FFT of the p-i-n pulse response obtains f3dB ≈1.4 GHz. Analysis in terms of reverse bias and geometric scaling indicates that the MSM photodetectors are transit-time limited. The p-i-n devices also show evidence of transit-time limited effects based on trends with respect to reverse bias and intrinsic region thickness. However, our larger area p-i-n devices show clear evidence of RC-limited behavior. Modeling of the temporal behavior indicates that a slow component in the time and frequency response data is a consequence of the hole drift velocity. We have also found preliminary evidence of microplasmic effects in the p-i-n devices.
引用
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页码:325 / 333
页数:8
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