Surface Reactivity of Single-Crystal Silicon in Atomic Layer Deposition Processes

被引：0
作者：
Yu. K. Ezhovskii
机构：
[1] St. Petersburg State Technological Institute (Technical University),
来源：
Inorganic Materials | 2019年 / 55卷
关键词：
single-crystal silicon; surface; hydroxyl groups; reactivity;
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摘要：
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页码：101 / 105
页数：4
相关论文
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  • [1] Aleskovskii V.B.(1982)On the nature of solid chemical compounds Zh. Prikl. Khim. 55 725-730
  • [2] Suntola T.(1989)Atomic layer epitaxy Mater. Sci. Rep. 4 261-312
  • [3] Ezhovskii Yu.K.(2006)A quantitative approach in chemical nanotechnology of solid surfaces Khim. Fiz. 25 72-90
  • [4] Ezhovskii Yu.K.(2013)Preparation of nanostructured silicon oxide and silicon nitride films using nanotechnologies Inorg. Mater. 49 904-908
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