Graphene doped polyaniline (G-PANI) nanocomposites with good electromagnetic properties were synthesized using an in situ emulsion polymerization method. Polyaniline was synthesized in ammonium persulfate and hydrochloric acid solution system. Graphene was added during the polymerization of aniline. Scanning electron microscopy and transmission electron microscopy analyses were performed to characterize the morphology of the nanocomposites. X-ray photoelectron spectroscopy provided the evidence for the oxidation of graphene. Conductivity and electromagnetic performances of polyaniline were improved after graphene doping. The reflection loss of G-PANI showed that the best electromagnetic wave absorbing was achieved at the graphene/polyaniline mass ratio of 1.5 × 10−3.
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Yunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R ChinaYunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R China
Du, Xinchen
Zhang, Luran
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Yunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R ChinaYunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R China
Zhang, Luran
Guo, Changjin
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Yunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R ChinaYunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R China
Guo, Changjin
Liu, Guoqiang
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Yunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R ChinaYunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R China
Liu, Guoqiang
Yuan, Huifeng
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Yunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R ChinaYunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R China
Yuan, Huifeng
Li, Yong
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Yunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R ChinaYunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R China
Li, Yong
Hu, Wanbiao
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Yunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R ChinaYunnan Univ, Natl Ctr Int Res Photoelect & Energy Mat, Electron Microscopy Ctr, Sch Mat & Energy,Key Lab LCR Mat & Devices Yunnan, Kunming 650091, Peoples R China
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French German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, FranceFrench German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, France
Gibot, Pierre
Bach, Arnaud
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French German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, France
UHA, CNRS UMR 7361, Inst Mat Sci Mulhouse IS2M, Mulhouse, FranceFrench German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, France
Bach, Arnaud
Vidal, Loic
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UHA, CNRS UMR 7361, Inst Mat Sci Mulhouse IS2M, Mulhouse, FranceFrench German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, France
Vidal, Loic
Schnell, Fabien
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French German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, FranceFrench German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, France
Schnell, Fabien
Gadiou, Roger
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UHA, CNRS UMR 7361, Inst Mat Sci Mulhouse IS2M, Mulhouse, FranceFrench German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, France
Gadiou, Roger
Spitzer, Denis
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French German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, FranceFrench German Res Inst St Louis, CNRS ISL UNISTRA UMR 3208, Lab Nanomat Syst Extreme Stress, 5 Rue Gen Cassagnou,BP7003, F-68301 St Louis, France