Thickness and Surface Profile Measurement by a Sinusoidal Wavelength-Scanning Interferometer

We propose a sinusoidal wavelength-scanning interferometer for measuring thickness and surface profile of a thin film. The interference signal contains phase modulation amplitude Z and phase $aL which are related to the positions and profiles of the reflecting surfaces, respectively. By reducing the difference between the detected signal and the estimated signal using the multidimensional nonlinear least-squares algorithm, we estimate values of Z and $aL. Experimental results show that the front and rear surfaces of a silica glass plate of 20 $mUm-thickness could be measured with an error less than 10 nm.