Phase-Change Memory Device Using Si-Sb-Te Film for Low Power Operation and Multibit Storage

被引:0
|
作者
Baowei Qiao
Jie Feng
Yunfeng Lai
Yanfei Cai
Yinyin Lin
Tingao Tang
Bingchu Cai
Bomy Chen
机构
[1] Shanghai Jiaotong University,National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, Institute of Micro and Nano Science and Technology
[2] Fudan University,State Key Laboratory of ASIC & System
[3] Silicon Storage Technology,undefined
[4] Inc.,undefined
来源
Journal of Electronic Materials | 2007年 / 36卷
关键词
Phase-change memory; SiSbTe; RESET current; Multibit storage;
D O I
暂无
中图分类号
学科分类号
摘要
The switching characteristics of the electrical phase-change memory device using a SiSbTe film were studied. The SiSbTe film has a wider variation of electrical resistivity (up to 107 times) along with crystallization than that of the conventionally used Ge2Sb2Te5 film, and the SiSbTe film crystallizes predominantly into the hexagonal phase in a manner similar to the Sb2Te3 phase. The threshold voltage of the device is 5.87 V. The device was successfully operated with a 100 ns–5.5 V pulse for setting and a 20 ns–3 V pulse for resetting. The RESET current is about 1.37 mA, and the programming energies for resetting and setting are about 110 pJ and 60 pJ, respectively. More than 100 cycles were achieved with a RESET/SET resistance ratio higher than 50. In addition, multiple stable resistance stages can be obtained by adjusting the SET pulse, which makes multibit storage per cell possible.
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页码:88 / 91
页数:3
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