Indium nanowires at the silicon surface

被引:0
作者
A. S. Kozhukhov
D. V. Sheglov
A. V. Latyshev
机构
[1] Russian Academy of Sciences,Institute of Semiconductor Physics, Siberian Branch
来源
Semiconductors | 2016年 / 50卷
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摘要
Conductive indium nanowires up to 50 nm in width and up to 10 μm in length are fabricated on the surface of silicon by local resputtering from the probe of an atomic-force microscope. The transfer of indium from the probe of the atomic-force microscope onto the silicon surface is initiated by applying a potential between the probe and the surface as they approach each other to spacings, at which the mutual repulsive force is ~10–7 N. The conductivity of the nanowires ranges from 7 × 10–3 to 4 × 10–2 Ω cm, which is several orders of magnitude lower than that in the case of the alternative technique of heat transfer.
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页码:901 / 903
页数:2
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共 53 条
[1]  
Piner R. D.(1999)undefined Science 283 661-undefined
[2]  
Zhu J.(2004)undefined Angew. Chem. Int. Ed. 43 30-undefined
[3]  
Xu F.(2006)undefined Appl. Phys. Lett. 88 033104-undefined
[4]  
Hong S. H.(2009)undefined ACS Nano 3 3543-undefined
[5]  
Mirkin C. A.(2012)undefined Beilstein J. Nanotechnol. 3 52-undefined
[6]  
Ginger D. S.(2005)undefined Langmuir 21 5242-undefined
[7]  
Zhang H.(2003)undefined Angew. Chem. Int. Ed. 42 2309-undefined
[8]  
Mirkin C. A.(2002)undefined Phys. Rev. Lett. 88 255505-undefined
[9]  
Nelson B. A.(2006)undefined Sens. Actuators A 125 504-undefined
[10]  
King W. P.(1998)undefined Appl. Surf. Sci. 130 139-undefined