Effects of thermal annealing on titanium oxide films prepared by ion-assisted deposition

被引：0
作者：
Cheng-Chung Jaing
Hsi-Chao Chen
Cheng-Chung Lee
机构：
[1] Minghsin University of Science and Technology,Department of Optoelectronic System Engineering/Department of Electronic Engineering
[2] De Lin Institute of Technology,Department of Electro
[3] National Central University,Optical Engineering
来源：
Optical Review | 2009年 / 16卷
关键词：
Titanium oxide films; substrate temperature; ion-assisted deposition; thermal annealing; optical properties; mechanical properties;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Titanium oxide thin films are prepared at a substrate temperature of 250 °C by electron-beam evaporation and ionassisted deposition. The effects of thermal annealing temperatures from 100 to 450 °C on the optical and mechanical properties are studied. The optical and mechanical properties include refractive indices, extinction coefficients, residual stress, surface roughness and crystallization. Experimental results show these properties of titanium oxide films clearly depend on the thermal annealing process.
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页码：396 / 399
页数：3
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