Study of the plasma plume generated during near IR femtosecond laser irradiation of silicon targets

被引:0
作者
S. Amoruso
C. Altucci
R. Bruzzese
C. de Lisio
N. Spinelli
R. Velotta
M. Vitiello
X. Wang
机构
[1] Complesso Universitario di Monte S. Angelo,Coherentia
[2] Università degli Studi di Napoli Federico II,INFM
[3] Complesso Universitario di Monte S. Angelo,Istituto Nazionale per la Fisica della Materia (INFM) – Unità di Napoli and Dipartimento di Scienze Fisiche
来源
Applied Physics A | 2004年 / 79卷
关键词
Femtosecond Laser; Emission Spectroscopy; Thermal Ablation; Plasma Plume; Ultrashort Laser Pulse;
D O I
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摘要
Ti:sapphire femtosecond laser ablation of silicon has been investigated by Langmuir probe and time-gated optical emission spectroscopy. The measured spectra show the presence of a fast ion population preceding the main plume core of slow ions and neutrals produced by a thermal ablation mechanism. By analyzing the fluence thresholds for the emission of the two ion populations, we provide clear experimental evidence that fast ions are ejected non-thermally from the sample surface as a result of the Si surface supercritical state induced by the intense ultrashort laser pulse irradiation.
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页码:1377 / 1380
页数:3
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