Properties of the Teflon AF1601S Surface Treated with the Low-Pressure Argon Plasma

被引：0
作者：
K. G. Sabbatovskii
V. Dutschk
M. Nitschke
F. Simon
K. Grundke
机构：
[1] Russian Academy of Sciences,Institute of Physical Chemistry
[2] Institute of Polymer Research e.V.,undefined
来源：
Colloid Journal | 2004年 / 66卷
关键词：
Polymer; Spectroscopy; Microscopy; Argon; Atomic Force Microscopy;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The stability of the surface properties of Teflon AF films were investigated after their exposure to the low-pressure argon plasma for various times. X-ray photoelectron and infrared spectroscopies, atomic force microscopy, scanning optical microscopy based on chromatic aberration, goniometry (the measurement of water contact angles), as well as electrokinetic method and ellipsometry were used to control changes in the chemical composition and surface properties of Teflon AF films taking place upon their plasma treatment. The stable hydrophilization of the surface of Teflon AF films resulted from plasma treatment was revealed.
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页码：208 / 215
页数：7
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