Erratum: Effects of plasma-enhanced chemical vapor deposition (PECVD) on the carrier lifetime of Al2O3 passivation stack

被引:0
作者
Kuk-Hyun Cho
Young Joon Cho
Hyo Sik Chang
Kyung-Joong Kim
Hee Eun Song
机构
[1] Chungnam National University,Graduate School of Energy Science Technology
[2] Korea Research Institute of Standards and Science,Photovoltaic Center
[3] Korea Institute of Energy Research,undefined
来源
Journal of the Korean Physical Society | 2015年 / 67卷
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页码:1708 / 1708
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