Low-temperature scanning tunnelling microscopy study of O2 adsorption on Ru(0001)

被引:0
作者
N. Nilius
M. Mitte
H. Neddermeyer
机构
[1] Martin-Luther-Universität Halle-Wittenberg,
[2] Fachbereich Physik D-06099 Halle/Germany (Fax: +49-345/5527160),undefined
来源
Applied Physics A | 1998年 / 66卷
关键词
PACS: 61.16, 68.35, 68.90;
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摘要
on Ru(0001) has been studied in the temperature range between 100 K and 300 K by means of low-temperature scanning tunnelling microscopy (STM). At temperatures below 130 K the existence of a molecular precursor state leads to the formation of dense, disordered islands (partly with a (1×1) configuration). Between 160 K and 170 K the onset of diffusion of the chemisorbed O atoms allows a local ordering process in the adsorbate layer. Above 210 K the system reaches a well-ordered equilibrium state, formed by (2×2) and (2×1) structures. From the analysis of the island density versus adsorption temperature data the diffusion energy for the physisorbed precursor state is estimated.
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页码:S519 / S523
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