Interaction of iron atoms with the Si(100)-2 × 1 surface

被引:0
作者
M. V. Gomoyunova
I. I. Pronin
D. E. Malygin
S. M. Solov’ev
D. V. Vyalykh
S. L. Molodtsov
机构
[1] Russian Academy of Sciences,Ioffe Physicotechnical Institute
[2] Technische Universität Dresden,Institut für Oberflächen
来源
Technical Physics | 2005年 / 50卷
关键词
Radiation; Iron; Spectroscopy; Silicon; Solid Solution;
D O I
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学科分类号
摘要
Interaction of iron atoms with the Si(100)-2 × 1 surface at room temperature is studied by core-level photoelectron spectroscopy using synchrotron radiation for Fe coverages ranging from a fraction of a monolayer to six monolayers. It is shown that the Fe/Si(100)-2 × 1 interface is chemically active: the Fe-Si solid solution forms early in deposition of iron on silicon. When the Fe coverage reaches four to five monolayers, the state of the system is changed and Fe3Si silicide arises.
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页码:1212 / 1216
页数:4
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