Correlation of Microstructural and Mechanical Properties of CVD Deposited TiAlN Coatings

被引：0
作者：
Soham Das
Ranjan Ghadai
Spandan Guha
Ashis Sharma
Bibhu P. Swain
机构：
[1] Sikkim Manipal Institute of Technology,Department of Mechanical Engineering
[2] Kalinga Institute of Industrial Technology Bhubaneswar,School of Mechanical Engineering
[3] National Institute of Technology,Department of Physics
[4] Manipur,undefined
来源：
Arabian Journal for Science and Engineering | 2020年 / 45卷
关键词：
TiAlN; APCVD; FESEM; XRD; AFM;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Titanium aluminum nitride (TiAlN) thin films were synthesized with different N2 flow rate on p-type Si (100) substrate and characterized by FESEM, AFM, XRD and nanoindentation to investigate the morphology, structural and mechanical properties. The FESEM images revealed non-uniform grain distribution with a higher degree of pores with the increase in N2 flow rate. The XRD data indicated the presence of AlN, TiAlN, Al2O3 dominant phases at 33.07°, 55.5°, 61.79° and 47.84°, 54.67° diffraction angles attributed to (100), (220) and (400), (112) diffraction plane, respectively. The AFM images revealed the average roughness as 36.9 nm for 30 sccm N2 flow rate. Furthermore, the mechanical properties such as H, E, plasticity index (H/E) and deformation to plastic resistance (H3/E2) of TiAlN thin film were found to be 21 GPa, 400 GPa, 0.094 and 0.318 GPa, respectively, indicating higher resistance to crack with increasing N2 flow rate.
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页码：967 / 975
页数：8
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