Study of the Electron–Phonon Relaxation in Thin Metal Films Using Transient Thermoreflectance Technique

被引:0
|
作者
Weigang Ma
Haidong Wang
Xing Zhang
Wei Wang
机构
[1] Tsinghua University,Key Laboratory for Thermal Science and Power Engineering of Ministry of Education, Department of Engineering Mechanics
[2] Peking University,Institute of Microelectronics
[3] National Key Laboratory of Science and Technology on Nano/Micro Fabrication,undefined
来源
International Journal of Thermophysics | 2013年 / 34卷
关键词
Electron–phonon relaxation; Femtosecond laser; Thin metal film; Transient thermoreflectance;
D O I
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中图分类号
学科分类号
摘要
Electron–phonon (e–ph) relaxation in thin metal films is an important consideration in many ultra-small and ultra-fast applications. In this work, e–ph relaxation in thin gold and aluminum films has been studied using the transient thermoreflectance technique which is demonstrated sensitive enough to study the relaxation process. The optical properties of the thin metal films are different from those of bulk metal and have been measured. Based on confirmation of the measurements, the effects of metal type, film thickness, and interface on e–ph relaxation have been experimentally studied. The thermoreflectance traces of gold and aluminum films have been compared. The results show that the e–ph relaxation and the effect of electron and lattice temperatures on the thermoreflectance of gold and aluminum are quite different. The e–ph relaxation is independent of film thickness and interface.
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页码:2400 / 2415
页数:15
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