Self-consistent compensated microfield model for a strongly coupled plasma

被引：0

作者：

Kalitkin N.N. ^{[1
]}

Kozlitin I.A. ^{[1
]}

机构：

[1] Institute for Mathematical Modeling, Russian Academy of Sciences, Miusskaya pl. 4a, Moscow

来源：

Mathematical Models and Computer Simulations | 2009年 / 1卷 / 1期

基金：

俄罗斯基础研究基金会;

关键词：

Form Factor; Neutral Particle; Density Distribution Function; Nonideal Plasma; Saha Equation;

D O I：

10.1134/S2070048209010049

中图分类号：

学科分类号：

摘要：

A compensated microfield model of plasma nonideality is proposed as an improvement of the traditional microfield models. In this model, a double contribution of a microfield to the truncation of statistical sums removed. The new method of truncation of the statistical sums of atoms or ions is compared with the results of experiments and computations performed by well-known Debye-type and other models. It is shown that only the microfield model correctly describes experiments. Ionization of Li and Hg atoms is calculated. The effect of metallization of plasma—an abrupt increase of ionization from zero to a single ionization at low temperatures and nearly normal densities—is qualitatively described. The results of calculation of Hg vapor ionization qualitatively agree with known experimental results on the measurement of electric conductivity of this vapor. © 2009, Pleiades Publishing, Ltd.

引用

页码：31 / 43

页数：12