Characterization of conductive Al-doped ZnO thin films for plasmonic applications

被引:0
作者
F. F. Masouleh
I. Sinno
R. G. Buckley
G. Gouws
C. P. Moore
机构
[1] Victoria University of Wellington,Robinson Research Institute
[2] Callaghan Innovation,undefined
[3] Victoria University of Wellington,undefined
来源
Applied Physics A | 2018年 / 124卷
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Highly conductive and transparent Al-doped zinc oxide films were produced by RF magnetron sputtering for plasmonic applications in the infrared region of the spectrum. These films were characterized using Fourier transform infrared spectroscopy, the Hall effect, Rutherford backscattering spectroscopy and spectral data analysis. Analysis of the results shows a carrier concentration of up to 2.6 × 1020 cm−3, as well as transmission over 80% near the plasma frequency where plasmonic properties are expected. The plasma frequency was calculated from the spectroscopy measurements and subsequent data analysis, and was in agreement with the results from the Hall effect measurements and the free electron gas (Drude) model. Based on these results, the Al-doped zinc oxide thin films are well-suited for plasmonic applications in the infrared region.
引用
收藏
相关论文
共 88 条
[1]  
Editorial N(2009)Beyond the diffraction limit Nat. Photonics 3 361-10052
[2]  
Kumar PN(2015)Ag plasmonic nanostructures and a novel gel electrolyte in a high efficiency TiO2/CdS solar cell Phys. Chem. Chem. Phys 17 10040-3969
[3]  
Deepa M(2000)Negative refraction makes a perfect lens Phys. Rev. Lett 85 3966-5271
[4]  
Srivastava AK(2012)Protection and functionalisation of silver as an optical sensing platform for highly sensitive SPR based analysis Analyst 137 5265-9
[5]  
Pendry JB(2014)Optimum deposition conditions of ultrasmooth silver nanolayers Nanoscale Res. Lett 9 1-6492
[6]  
Manickam G(2009)Stranski-Krastanov-like growth of an Ag film on a metallic glass Thin Solid Films 24 6486-408
[7]  
Gandhiraman R(2007)Far-field optical superlens Nano Let 7 403-6954
[8]  
Vijayaraghavan RK(2007)Experimental studies of far-field superlens for sub-diffractional optical imaging Opt. Exp 15 6947-7
[9]  
Kerr L(2016)Plasmonic structures, materials and lenses for optical lithography beyond the diffraction limit: a review Micromachines 7 118-754
[10]  
Doyle C(2011)A comparative study of semiconductor-based plasmonic metamaterials Metamaterials 5 1-3294