Photoluminescence quantum efficiency of Er optical centers in GaN epilayers

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作者
V. X. Ho
T. V. Dao
H. X. Jiang
J. Y. Lin
J. M. Zavada
S. A. McGill
N. Q. Vinh
机构
[1] Virginia Tech,Department of Physics & Center for Soft Matter and Biological Physics
[2] Blacksburg,Department of Electrical and Computer Engineering
[3] Texas Tech University,Department of Electrical and Computer Engineering
[4] New York University,undefined
[5] National High Magnetic Field Laboratory,undefined
[6] 1800 E. Paul Dirac Dr.,undefined
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Scientific Reports | / 7卷
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摘要
We report the quantum efficiency of photoluminescence processes of Er optical centers as well as the thermal quenching mechanism in GaN epilayers prepared by metal-organic chemical vapor deposition. High resolution infrared spectroscopy and temperature dependence measurements of photoluminescence intensity from Er ions in GaN under resonant excitation excitations were performed. Data provide a picture of the thermal quenching processes and activation energy levels. By comparing the photoluminescence from Er ions in the epilayer with a reference sample of Er-doped SiO2, we find that the fraction of Er ions that emits photon at 1.54 μm upon a resonant optical excitation is approximately 68%. This result presents a significant step in the realization of GaN:Er epilayers as an optical gain medium at 1.54 μm.
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