Field-ion microscopy of deformation effects near the surface in ion-implanted metals (Ir)

被引：0

作者：

B. A. Ivchenko

N. N. Syutkin

机构：

[1] Ural Branch of the Russian Academy of Sciences,Institute of Electrophysics

来源：

Technical Physics Letters | 1999年 / 25卷

关键词：

Microscopy; Iridium; Deformation Effect; Irradiate Surface; Pure Iridium;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Field-ion microscopy is used to determine the deformation due to ion implantation (E=20 keV, D=1018 ions/cm2, j=300 μA/cm2) near the surface in pure iridium. The effect is manifested as a high density of various types of defects in the near-surface volume (∼50 nm from the irradiated surface) of the material.

引用

页码：233 / 234

页数：1