Ferroelectric properties of (Bi3.15Nd0.85)Ti3O12with decreasing film thickness

被引:0
作者
Xingsen Gao
John Wang
机构
[1] National University of Singapore,Department of Materials Science and Engineering, Faculty of Engineering
来源
Journal of Electroceramics | 2006年 / 16卷
关键词
Bi; Ti; O; thin film; Ferroelectric behaviors; Thickness dependence; Layered perovskite structure; FRAM;
D O I
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中图分类号
学科分类号
摘要
Film texture and ferroelectric behaviors of (Bi3.15Nd0.85)Ti3O12 (BNdT) of layered-perovskite structure deposited on Pt/TiO2/Si substrate are dependent on the film thickness. When the film thickness is reduced from ∼240 to ∼120 nm, BNdT grains evolve from a rod-like morphology to a spherical morphology, accompanied by a decrease in average grain size. At the same time, P-E hysteresis transforms from a square-shaped hysteresis loop (2Pr ∼24.1 μC/cm2 at 240 nm) to a relative slimmer hysteresis loop (with a lower 2Pr = 19.8 μC/cm2 at 120 nm). The nonvolatile polarization (Δ P) shows a maximum at the film thickness of 160 nm, where Δ P was measured to be 14.7 μC/cm2 and 6.8 μC/cm2 at 5 V and 3 V, respectively. A small amount of excess bismuth in the film thickness of 130 nm, introduced by co-sputtering, can lead to a much enhanced remanent polarization (2Pr of 21.3 μC/cm2 at 5 V and 15.2 μC/cm2at 3 V), which is promising for low voltage FRAM applications.
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页码:477 / 481
页数:4
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