The influence of titanium doping on the electric properties of amorphous alumina films prepared by sol–gel technology

被引：1
作者：
Manwen Yao
Ruihua Xiao
Yong Peng
Jianwen Chen
Baofu Hu
Xi Yao
机构：
[1] Tongji University,Functional Materials Research Laboratory
来源：
Journal of Sol-Gel Science and Technology | 2015年 / 74卷
关键词：
Alumina film; Titanium doping; Breakdown strength; Soft breakdown;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The influence of titanium doping on the electric properties of amorphous alumina (Al2O3) films prepared by sol–gel technology was investigated. EDX mapping analysis indicates that the titanium cations are uniformly distributed in the film as Al2−xTixOy. The XPS analysis reveals that the titanium exists in the form of TiO2. The breakdown strength of the doped film can be much enhanced by the titanium doping. The dielectric strength of undoped Al2O3 films is 3.4 MV/cm, while the breakdown strength of the 10 % Ti-doped Al2O3 films is 5.3 MV/cm. Compared with the undoped Al2O3 films, the soft breakdown of Ti-doped Al2O3 films is gradually suppressed with the increasing of the titanium doping amount. Especially, there is hardly any soft breakdown observed for 10 % Ti-doped Al2O3 films.
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页码：39 / 44
页数：5
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