Thermal Radiation Phenomena of Surfaces of Chromium and Palladium in a High-Temperature Environment

被引:0
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作者
Hidenobu Wakabayashi
Toshiro Makino
机构
[1] Kyoto University,Department of Mechanical Engineering and Science
来源
关键词
Chromium; Hemispherical reflectance; Normal emittance; Palladium; Real surface; Simultaneous measurement; Spectroscopic measurement; Thermal radiation;
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摘要
For the purpose of thermal engineering applications, thermal radiation phenomena of surfaces of chromium and palladium in a high-temperature air-oxidation process on the basis of simultaneous measurements of spectra of normal incidence hemispherical reflectance and normal emittance in the near-ultraviolet through infrared region are investigated. As the results of the spectral measurements, clear radiation interference is observed even in the spectra of the hemispherical reflectance of a rough-finished chromium surface in the oxidation process as well as in the spectra of the normal reflectance of a specular-finished surface. The relation between the chemical reactions of oxidation and reduction of a palladium surface in the 1000 K to 1100 K range and the radiation characteristics are analyzed based on the temperature hysteresis of radiation spectra and the reaction rates of oxidation and reduction. A switching function of radiation characteristics of palladium accompanied by the oxidation and reduction reactions is suggested to be applicable for engineering applications.
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页码:2112 / 2126
页数:14
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