Peculiarities of chromium electrodeposition from water − dimethylformamide solutions

被引：0
作者：
Vitaly V. Kuznetsov
Leonid N. Pavlov
Elena A. Filatova
Eugeny G. Vinokurov
机构：
[1] DI Mendeleyev University of Chemical Technology of Russia,
来源：
Journal of Solid State Electrochemistry | 2018年 / 22卷
关键词：
Electrodeposition; Chromium; Near-cathode layer; Incomplete reduction;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Electrodeposition of chromium from both CrCl2- and CrCl3-containing dimethylformamide (DMF)–water solutions is studied. It is found that the process of chromium deposition from Cr(II)-containing solutions is stable during the whole period of electrolysis, while the rate of electrodeposition from Cr(III)-containing electrolytes gradually decreases. To explain the experimental results, it has been assumed that the film consisting of chromium oxide and hydroxide species is formed in the near-cathode region during electrolysis in Cr(III)-based baths. The physical properties of this film are critical for chromium electrodeposition. It is necessary to maintain the negative potential sufficient for Cr(II)→Cr electroreduction at the electrode-film interface for the sustained chromium plating. Under such conditions, thick (up to 100 μm) Cr–C coatings of good quality can be deposited.
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页码：217 / 225
页数：8
相关论文
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