Oxygen Gettering Effect During the Reactive Evaporation of Manganese Oxide Films

被引：0
作者：
Masaaki Isai
Katsuma Yamaguchi
Haruhiko Iyoda
Hiroshi Fujiyasu
Yasumitsu Ito
机构：
[1] Shizuoka University,Department of Electrical and Electronic Engineering
[2] Suzuki Motor Corporation,Miyakoda Electronics Technical Center
来源：
Journal of Materials Research | 1999年 / 14卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Manganese oxide films for lithium secondary batteries were prepared using a reactive evaporation method. Mn was evaporated from a molybdenum boat by resistive heating and deposited on a glass slide under oxygen atmosphere. These films were examined with x-ray photoelectron spectroscopy (XPS) and x-ray diffraction. The Mn oxide films with a wide valency of Mn were prepared in this study. A rapid change of the back pressure was found as the deposition of Mn was started. This implies that Mn atoms start to react with O2. This means that in situ detection of reactive evaporation process can be utilized.
引用
收藏
相关论文
共 50 条
  • [41] Effect of oxidation state of manganese in manganese oxide thin films on their capacitance performances
    Wang, Zhisqiang
    Yang, Dongfang
    Sham, Tsun-Kong
    SURFACE SCIENCE, 2018, 676 : 71 - 76
  • [42] Conducting indium oxide films on plastic substrates by plasma enhanced reactive thermal evaporation
    Vygranenko, Y.
    Fernandes, M.
    Vieira, M.
    Lavareda, G.
    Nunes de Carvalho, C.
    Brogueira, P.
    Amaral, A.
    THIN SOLID FILMS, 2019, 691
  • [43] HIGHLY TRANSPARENT AND CONDUCTING ZINC-OXIDE FILMS DEPOSITED BY ACTIVATED REACTIVE EVAPORATION
    LAU, WS
    FONASH, SJ
    JOURNAL OF ELECTRONIC MATERIALS, 1987, 16 (03) : 141 - 149
  • [44] PROPERTIES OF TIN OXIDE-FILMS PREPARED BY REACTIVE ELECTRON-BEAM EVAPORATION
    BANERJEE, R
    DAS, D
    THIN SOLID FILMS, 1987, 149 (03) : 291 - 301
  • [45] Oxygen amount effect on optical properties of aluminium oxide nanostructured films prepared by reactive magnetron sputtering
    Koushki, E.
    Mousavi, S. H.
    Baedi, J.
    OPTIK, 2016, 127 (11): : 4635 - 4638
  • [46] AMORPHOUS-TO-CRYSTALLINE TRANSITION OF INDIUM OXIDE-FILMS DEPOSITED BY REACTIVE EVAPORATION
    ITO, K
    NAKAZAWA, T
    OSAKI, K
    THIN SOLID FILMS, 1987, 151 (02) : 215 - 222
  • [47] Preparation and properties of indium tin oxide films deposited on polyester substrates by reactive evaporation
    Ma, J
    Li, SY
    Zhao, JQ
    Ma, HL
    THIN SOLID FILMS, 1997, 307 (1-2) : 200 - 202
  • [48] Tin-manganese-nickel oxide thin films prepared by thermal evaporation for photosensor applications
    Kuo, Chia-Tung
    Chu, Yu-Ying
    Chen, Han-Yi
    Yew, Tri-Rung
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2021, 268
  • [49] Oxygen content of indium tin oxide films fabricated by reactive sputtering
    Honda, Shinichi
    Tsujimoto, Akira
    Watamori, Michio
    Oura, Kenjiro
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1995, 13 (3 pt 1):
  • [50] TANTALUM OXIDE FILMS PREPARED BY OXYGEN PLASMA ANODIZATION AND REACTIVE SPUTTERING
    VRATNY, F
    AMERICAN CERAMIC SOCIETY BULLETIN, 1966, 45 (04): : 401 - &
12345