A Schmitt-Trigger-Based Low-Voltage 11 T SRAM Cell for Low-Leakage in 7-nm FinFET Technology

被引:0
作者
Erfan Abbasian
Elangovan Mani
Morteza Gholipour
Mehrzad Karamimanesh
Mohd Sahid
Adil Zaidi
机构
[1] Babol Noshirvani University of Technology,Faculty of Electrical and Computer Engineering
[2] Government College of Engineering,Department of Electronics and Communication Engineering
[3] Srirangam,Department of Electrical and Electronics Engineering
[4] Shiraz University of Technology,Department of Electronics and Communication Engineering
[5] Mewat Engineering College,undefined
来源
Circuits, Systems, and Signal Processing | 2022年 / 41卷
关键词
FinFET; SRAM; Schmitt-trigger; Single-ended; Ultra-low-voltage; Low-power; Subthreshold;
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中图分类号
学科分类号
摘要
This paper proposes a modified Schmitt-trigger (ST)-based single-ended 11 T (MST11T) SRAM cell. The proposed cell is best suited to ultra-low voltage applications. Two ST-based cross-coupled inverters comprise the storage cell of the proposed MST11T bit cell. In comparison with conventional inverters, ST-based inverters have sharp voltage transfer characteristics. As a result, the proposed bit cell’s stability performance increases. The proposed SRAM cell’s leakage power consumption is reduced because of the use of stacked N-type transistors. For the read operation of the proposed bit cell, the read decoupled technique is used. As a result, the read static noise margin (RSNM) has greatly improved. The proposed bit cell’s write static noise margin (WSNM) is increased by adopting feedback-cutting methodology. The performance of the proposed bit cell is compared with that of conventional 6 T, conventional 8 T, Schmitt-trigger 10 T (known as ST2), modified PMOS-PMOS-NMOS-based cell core 10 T (MPPN10T), feedback-cutting 11 T (FC11T), Schmitt-trigger 11 T (ST11), and Schmitt-trigger 12 T (ST12T) cells. According to the simulation results, the proposed MST11T SRAM cell has RSNM of 2.42, 1.18, 1.71, 1.30, and 1.80 times higher when compared to 6 T, FC11T, ST2, MPPN10T, and ST12T, respectively. The WSNM of the proposed bit cell has been increased by 1.56, 2.44, 1.28, 1.71, 1.35, 1.52, and 1.02 times, respectively, over 6 T, 8 T, ST2, MPPN10T, FC11T, ST11T, and ST12T. Furthermore, the suggested cell has a read delay that is 1.32, 1.79, and 1.53 times lower than ST11T, FC11T, and ST12T, respectively. The proposed bit cell has a write delay that is 1.14 and 1.63 times lower than FC11T and ST11T, respectively. The proposed MST11T bit-cell consumes 3.74, 1.56, 4.59, 5.38, and 4.83 times less leakage power than the 8 T, ST2, MPPN10T, FC11T, and ST12 bit-cells, respectively. When compared to 8 T/ST2/MPPN10T/ST12T at 0.2 V supply voltage, the enhanced facts incur a 4.87/3.79/3.78/1.97 penalty in write delay. The figure of merit (FOM) is derived as a result of this extensive access to the revolutionary SRAM cell performance, i.e., offering greater values at a 0.2 V DC supply voltage. In addition, the paper examines the impact of manufacturing process and temperature changes on MST11T cell enactment, as well as the circuit robustness using HSPICE with 7-nm FinFET technology.
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页码:3081 / 3105
页数:24
相关论文
共 87 条
[1]  
Abbasian E(2020)A variation-aware design for storage cells using Schottky-barrier-type GNRFETs J. Comput. Electron. 19 987-1001
[2]  
Gholipour M(2017)Low leakage single bitline 9 t (sb9t) static random access memory Microelectron. J. 62 1-11
[3]  
Ahmad S(2018)Robust TFET SRAM cell for ultra-low power IoT applications AEU Int. J. Electron. Commun. 89 70-76
[4]  
Gupta MK(2017)Low leakage single bitline 9T (SB9T) static random access memory Microelectron. J. 62 1-11
[5]  
Alam N(2015)A near-threshold 7T SRAM cell with high write and read margins and low write time for sub-20 nm FinFET technologies Integration 50 91-106
[6]  
Hasan M(2018)Efficient and robust SRAM cell design based on quantum-dot cellular automata ECS J. Solid State Sci. Technol. 7 Q38-1561
[7]  
Ahmad S(2020)One-sided schmitt-trigger-based 9T SRAM cell for near-threshold operation IEEE Trans. Circuits Syst. I Regul. Pap. 67 1551-506
[8]  
Alam N(2018)A robust and low-power near-threshold SRAM in 10-nm FinFET technology Analog Integr. Circ. Sig. Process 94 497-368
[9]  
Hasan M(2019)A low-power single-ended SRAM in FinFET technology AEU-Int. J. Electron. Commun. 99 361-526
[10]  
Ahmad S(2019)A low-leakage and high-writable SRAM cell with back-gate biasing in FinFET technology J. Comput. Electron. 18 519-2353